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HQ-D Manueller Handler

Products

Semiconductor Manufacturing Equipments

The HemeraHT rapid thermal processing equipment (RTP) is based on a dual side lamp field vacuum chamber concept. The HemeratHT is either available with automatic or manual loading and for wafer sizes up to 200 mm.
Our automatic handling system (equipment front end module, EFEM) including fab automation for up to 300 mm wafer size is optional capable for small wafer sizes (50 – 100 mm), multi wafer processing or automatic susceptor or box handling for wide band gab semiconductors.

Hemera HT

The HemeraHT rapid thermal processing equipment (RTP) is based on a dual side lamp field vacuum chamber concept. The HemeratHT is either available with automatic or manual loading and for wafer sizes up to 200 mm.

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Hyperion LT

Our low temperature microwave plasma oxidation and nitridation system is equipped with our unique microwave plasma stick array and optional lower tungsten halogen lamp field for additional and separate rapid thermal heating of waver sizes 50 to 300 mm.

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Components

For our customers we also develop and provide single components from our systems, e.g. pyrometer, plasma/microwave sensors.
 

Pyrometers

We offer various pyrometers with multiple measurement wavelengths and bandwidths. Different sensor types and measurement principles cover the whole range from room temperature to 1700 °C. 


Plasma-/Microwave Sensors

Our sensor measures microwave radiation inside the process chamber.