This one cubic meter cube is designed for the fabrication of diamond-based photonic chips and heats samples in a high vacuum to suppress unwanted oxidation processes on the diamond surface.
The furnace allows a very low oxygen partial pressure during the annealing process at a minimum of 1400 °C for several hours. The highly reflective aluminum chamber contains protective plates surrounding the specimen stage. This can accommodate samples up to 15x15 mm² in size. SiC samples can also be cured in this furnace after implantation.